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Patent Searching and Data


Title:
SUBSTRATE PROCESSING METHOD AND COATING/DEVELOPING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2008/096835
Kind Code:
A1
Abstract:
A processing container of a coating/developing apparatus is provided with an ultraviolet irradiation section for irradiating a substrate with ultraviolet having a wavelength of 120-190nm; a gas supply port for supplying an inert gas; and an exhaust port for exhausting atmosphere in the processing container. The processing container is kept to have atmosphere not containing oxygen atoms and water molecules by supplying the inert gas from the gas supply port and exhausting the atmosphere inside the processing chamber from the exhaust port. Under such atmosphere, the substrate is irradiated with ultraviolet from an ultraviolet irradiating section. At the time of processing the substrate after development, a solvent contained in a resist can be removed without deforming the resist.

Inventors:
MATSUOKA TAKAAKI (JP)
INOKUCHI ATSUTOSHI (JP)
OHMI TADAHIRO (JP)
Application Number:
JP2008/052088
Publication Date:
August 14, 2008
Filing Date:
February 01, 2008
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
UNIV TOHOKU (JP)
MATSUOKA TAKAAKI (JP)
INOKUCHI ATSUTOSHI (JP)
OHMI TADAHIRO (JP)
International Classes:
H01L21/027; F26B5/04; F26B21/14; G03F7/40
Foreign References:
JP2004309955A2004-11-04
JPH04314323A1992-11-05
JPH0427113A1992-01-30
JPS63237418A1988-10-03
Other References:
OMI ET AL.: "Hoshutsu Gas o 2-keta Herasu Resist Tofu.Genzo Process", NIKKEI MICRODEVICES, 1990, pages 86 - 92
Attorney, Agent or Firm:
KANEMOTO, Tetsuo et al. (Hazuki International, Shinjuku Akebonobashi Building 1-12, Sumiyoshi-cho, Shinjuku-k, Tokyo 65, 1620065, JP)
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