Title:
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/021903
Kind Code:
A1
Abstract:
Provided is a method for supplying a pre-dying treatment liquid, which includes an adsorbing material to be adsorbed onto the surface of a pattern formed on a substrate, on the surface of the horizontally-held substrate and adsorbing the adsorbing material to the surface of the pattern. An adsorption film that includes the adsorbing material adsorbed to the surface of the pattern is formed along the surface of the pattern by removing the pre-dying treatment liquid of a portion on the surface of the horizontally-held substrate by the rotation of the substrate around the vertical axis of rotation. The adsorption film is removed from the surface of the substrate by changing the adsorption film to gas.
Inventors:
ABE HIROSHI (JP)
OKUTANI MANABU (JP)
OTSUJI MASAYUKI (JP)
YOSHIDA YUKIFUMI (JP)
OKUTANI MANABU (JP)
OTSUJI MASAYUKI (JP)
YOSHIDA YUKIFUMI (JP)
Application Number:
PCT/JP2019/023720
Publication Date:
January 30, 2020
Filing Date:
June 14, 2019
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/304
Domestic Patent References:
| WO2017169018A1 | 2017-10-05 |
Foreign References:
| JP2013016699A | 2013-01-24 | |||
| JP2018046063A | 2018-03-22 |
Attorney, Agent or Firm:
AI ASSOCIATION OF PATENT AND TRADEMARK ATTORNEYS (JP)
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