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Patent Searching and Data


Title:
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD AND COMPUTER STORAGE MEDIUM
Document Type and Number:
WIPO Patent Application WO/2019/151041
Kind Code:
A1
Abstract:
A substrate processing system for processing a substrate, which comprises: a carry in/out unit for carrying a substrate between the system and the outside; a processing unit for processing a surface of the substrate; a cleaning unit which is provided between the carry in/out unit and the processing unit when viewed in plan, and which cleans the substrate surface processed by the processing unit; a first conveyance unit which is superposed on the cleaning unit and conveys the substrate; and a second conveyance unit which is provided between the processing unit and the first conveyance unit when viewed in plan, and which conveys the substrate. The first conveyance unit coveys the substrate between the carry in/out unit and the second conveyance unit; and the second conveyance unit conveys the substrate between the first conveyance unit and the processing unit, and also conveys the substrate between the processing unit and the cleaning unit.

Inventors:
KODAMA, Munehisa (1-1 Fukuhara, Koshi Cit, Kumamoto 16, 〒8611116, JP)
Application Number:
JP2019/001836
Publication Date:
August 08, 2019
Filing Date:
January 22, 2019
Export Citation:
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Assignee:
TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-ku Tokyo, 25, 〒1076325, JP)
International Classes:
H01L21/304; B24B7/00; B24B37/10; H01L21/677
Domestic Patent References:
WO2017138355A12017-08-17
Foreign References:
JP2004154893A2004-06-03
JP2004096089A2004-03-25
JPH11309652A1999-11-09
JP2006344878A2006-12-21
Attorney, Agent or Firm:
KANEMOTO, Tetsuo et al. (Akebono International, Kakubari Building 1-20, Sumiyoshi-cho, Shinjuku-k, Tokyo 65, 〒1620065, JP)
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