Title:
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE TRANSFERRING METHOD
Document Type and Number:
WIPO Patent Application WO/2011/102648
Kind Code:
A2
Abstract:
The present invention relates to a substrate processing system and a substrate processing method which can improve transferring efficiency of a substrate by bilaterally transferring a substrate using a bidirectional substrate transferring portion of a substrate transferring device installed among a plurality of process chambers arranged in an in-line form and can transfer the substrate to a correct position by rotating the bidirectional substrate transferring portion. The substrate processing system comprises: a transfer chamber having at least one bidirectional substrate transferring unit for transferring a substrate in both directions; and a plurality of process chambers which is arranged in an in-line form across the transfer chamber and performs a semiconductor manufacturing process for the substrate. At least one of the bidirectional substrate transferring unit comprises: a transferring portion which is provided within the transfer chamber to be horizontally transferred by a linear motor; a bidirectional substrate transferring portion which is installed at the transferring portion to transfer the substrate to the process chamber through the bidirectional sliding; and a rotation portion which is installed between the transferring portion and the bidirectional substrate transferring portion to rotate the bidirectional substrate transferring portion at a predetermined angle.
Inventors:
LEE, Kyoo Hwan (1 Yeonwonmaeul LG Apt, Mabuk-dong Giheung-g, Yongin-si Gyeonggi-do 446-936, 446-936, KR)
이규환 (경기도 용인시 기흥구 마북동 연원마을 LG, 446-936 Gyeonggi-do, 446-936, KR)
MOON, Deck Won (2370, Yongdam 3-dongJeju-si, Jeju-do 690-043, 690-043, KR)
이규환 (경기도 용인시 기흥구 마북동 연원마을 LG, 446-936 Gyeonggi-do, 446-936, KR)
MOON, Deck Won (2370, Yongdam 3-dongJeju-si, Jeju-do 690-043, 690-043, KR)
Application Number:
KR2011/001048
Publication Date:
August 25, 2011
Filing Date:
February 17, 2011
Export Citation:
Assignee:
JUSUNG ENGINEERING CO., LTD. (49 Neungpyeong-ri, Opo-eupGwangju-si, Gyeonggi-do 464-892, 464-892, KR)
주성엔지니어링(주) (경기도 광주시 오포읍 능평리 49, 464-892 Gyeonggi-do, 464-892, KR)
LEE, Kyoo Hwan (1 Yeonwonmaeul LG Apt, Mabuk-dong Giheung-g, Yongin-si Gyeonggi-do 446-936, 446-936, KR)
이규환 (경기도 용인시 기흥구 마북동 연원마을 LG, 446-936 Gyeonggi-do, 446-936, KR)
주성엔지니어링(주) (경기도 광주시 오포읍 능평리 49, 464-892 Gyeonggi-do, 464-892, KR)
LEE, Kyoo Hwan (1 Yeonwonmaeul LG Apt, Mabuk-dong Giheung-g, Yongin-si Gyeonggi-do 446-936, 446-936, KR)
이규환 (경기도 용인시 기흥구 마북동 연원마을 LG, 446-936 Gyeonggi-do, 446-936, KR)
International Classes:
H01L21/677; B25J5/02; B65G49/06
Attorney, Agent or Firm:
ASTRAN INT'L IP GROUP (5th Floor, Shin Sung Bldg.732-27, Yeoksam-dong, Gangnam-gu, Seoul 135-514, 135-514, KR)
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Claims: