Title:
SUBSTRATE PROCESSING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2015/098596
Kind Code:
A1
Abstract:
This substrate processing system for processing substrates has: a processing station that is provided with a plurality of processing apparatuses for processing the substrates; an interface station that directly or indirectly transfers the substrates between the substrate processing system and an exposure apparatus, which is provided outside of the substrate processing system, and which performs pattern exposure with respect to resist films on the substrates; a light irradiation apparatus that performs post exposure using UV light with respect to the resist films on the substrates having been subjected to the pattern exposure; and a post exposure station, which houses the light irradiation apparatus, and which can be adjusted to be under a reduced-pressure atmosphere or an inert gas atmosphere. The post exposure station is connected directly or indirectly, via a space, to the exposure apparatus, said space being adjustable to be under the reduced-pressure atmosphere or the inert gas atmosphere.
Inventors:
NAGAHARA SEIJI (JP)
SHIRAISHI GOUSUKE (JP)
SHIMURA SATORU (JP)
YOSHIHARA KOUSUKE (JP)
KAWAKAMI SHINICHIRO (JP)
TOMONO MASARU (JP)
TAGAWA SEIICHI (JP)
OSHIMA AKIHIRO (JP)
SHIRAISHI GOUSUKE (JP)
SHIMURA SATORU (JP)
YOSHIHARA KOUSUKE (JP)
KAWAKAMI SHINICHIRO (JP)
TOMONO MASARU (JP)
TAGAWA SEIICHI (JP)
OSHIMA AKIHIRO (JP)
Application Number:
PCT/JP2014/083139
Publication Date:
July 02, 2015
Filing Date:
December 15, 2014
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
UNIV OSAKA (JP)
UNIV OSAKA (JP)
International Classes:
H01L21/027; G03F7/20; H01L21/677
Foreign References:
| JP2013197337A | 2013-09-30 | |||
| JPH02264961A | 1990-10-29 | |||
| JP2005101018A | 2005-04-14 |
Attorney, Agent or Firm:
KANEMOTO, Tetsuo et al. (JP)
Tetsuo Kanamoto (JP)
Tetsuo Kanamoto (JP)
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