Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
SUBSTRATE PROCESSING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2015/151676
Kind Code:
A1
Abstract:
This substrate processing system for processing a plurality of substrates has: a torus processing chamber, which contains the substrates, and performs predetermined processing; a cassette placing section for placing a cassette having the substrates contained therein; and a substrate transfer mechanism that transfers the substrates between the processing chamber and the cassette placing section. In the processing chamber, the substrates are concentrically disposed in a planar view.

Inventors:
FUJINO YUTAKA (JP)
Application Number:
PCT/JP2015/055818
Publication Date:
October 08, 2015
Filing Date:
February 27, 2015
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/677; C23C16/458; H01L21/205; H01L21/3065; H01L21/31
Foreign References:
JPH01142081A1989-06-02
JPH05179428A1993-07-20
Attorney, Agent or Firm:
KANEMOTO, Tetsuo et al. (JP)
Tetsuo Kanamoto (JP)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: LIGHT FLUX CONTROL MEMBER, LIGHT-EMITTING DEVICE, PLANAR LIGHT SOURCE DEVICE AND DISPLAY DEVICE

Next Patent: TRANSPARENT CONDUCTIVE MEMBER AND METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE MEMBER