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Title:
SUBSTRATE PRODUCTION MONITORING DEVICE AND SUBSTRATE PRODUCTION MONITORING METHOD
Document Type and Number:
WIPO Patent Application WO/2015/114828
Kind Code:
A1
Abstract:
The present invention is a substrate production monitoring device which monitors the production state of a substrate production device, said substrate production monitoring device being provided with: a database unit, which sequentially acquires and stores production state data from a substrate production device; a transition graph display unit which displays a transition graph representing time-series changes for at least a portion of the production state data; a condition change input unit, into which are input condition change data, which represent points of change in production conditions for the substrate production device, and include occurrence time information for the points of change; and a condition change display unit which displays, from the condition change data, at least the occurrence time information for the points of change at time-series corresponding positions within the transition graph. As a result, the device makes it possible to facilitate confirmation by an operator so as to mitigate the burden thereupon, and, in addition, is effective in diagnosis and/or determination of an action for improvement and/or verification of effects of the implemented action for improvement when production efficiency decreases.

Inventors:
MORITA YUKITOSHI (JP)
Application Number:
PCT/JP2014/052436
Publication Date:
August 06, 2015
Filing Date:
February 03, 2014
Export Citation:
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Assignee:
FUJI MACHINE MFG (JP)
International Classes:
H05K13/00
Foreign References:
JP2011185638A2011-09-22
JP2005327909A2005-11-24
JP2012033070A2012-02-16
JP2004363312A2004-12-24
JP2008251714A2008-10-16
JP2013105896A2013-05-30
Other References:
See also references of EP 3104674A4
Attorney, Agent or Firm:
KOBAYASHI OSAMU (JP)
Kobayashi 脩 (JP)
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