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Title:
SUBSTRATE PROVIDED WITH REFLECTING LAYER FOR EUV LITHOGRAPHY, AND REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO/2012/014904
Kind Code:
A1
Abstract:
Provided are an EUV mask blank wherein deterioration of reflectivity due to oxidation of a Ru protection layer is suppressed, a functional film-attached substrate to be used for the purpose of manufacturing the EUV mask blank, and a method for manufacturing the functional film-attached substrate. The substrate provided with a reflecting layer for EUV lithography has the reflecting layer, which reflects EUV light, and a protection film, which protects the reflecting layer, in this order on a substrate. The substrate provided with the reflecting layer for EUV lithography is characterized in that: the reflecting layer is a Mo/Si multilayer reflecting film; the protection layer is a Ru layer or a Ru compound layer; an intermediate layer is formed between the reflecting layer and the protection layer, said intermediate layer being composed of a first layer containing 0.5-25 at% of nitrogen and 75-99.5 at% of Si, and a second layer containing 60-99.8 at% of Ru, and 0.1-10 at% of nitrogen, and 0.1-30 at% of Si, and having a total film thickness of the first layer and the second layer of 0.2-2.5 nm; the first layer constituting the intermediate layer is formed on the reflecting layer side; the second layer is formed on the first layer; and the protection layer substantially does not contain Si.

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Inventors:
MIKAMI MASAKI (JP)
KINOSHITA TAKERU (JP)
Application Number:
PCT/JP2011/066993
Publication Date:
February 02, 2012
Filing Date:
July 26, 2011
Export Citation:
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Assignee:
ASAHI GLASS CO LTD (JP)
MIKAMI MASAKI (JP)
KINOSHITA TAKERU (JP)
International Classes:
H01L21/027
Foreign References:
JP2006332153A2006-12-07
JP2005516182A2005-06-02
JP2005286203A2005-10-13
JP2003318104A2003-11-07
JP2007273656A2007-10-18
JP2003501823A2003-01-14
JP2010168298A2010-08-05
Other References:
See also references of EP 2600388A4
Attorney, Agent or Firm:
SENMYO, Kenji et al. (JP)
Spring name Kenji (JP)
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Claims:



 
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