Title:
SUBSTRATE RETENTION DEVICE AND SUBSTRATE SUCTIONING METHOD
Document Type and Number:
WIPO Patent Application WO/2020/179486
Kind Code:
A1
Abstract:
This substrate retention device has a stage and an intake air conduit. The stage allows a substrate to be placed thereupon and holds the substrate by suctioning the rear surface thereof by vacuum. The intake air conduit is connected to a vacuum pump that performs suction via vacuum. A substrate placement surface of the stage is divided into a plurality of regions. The suction force used for suction via vacuum is configured to be switchable among the respective regions by using valves provided to the intake air conduit so as to correspond to the respective regions. The plurality of regions each have a plurality of fine pores formed therein.
Inventors:
OBIKANE TADASHI (JP)
Application Number:
PCT/JP2020/006971
Publication Date:
September 10, 2020
Filing Date:
February 21, 2020
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/683
Foreign References:
| JPH1086085A | 1998-04-07 | |||
| JPH1167882A | 1999-03-09 | |||
| JP2010129706A | 2010-06-10 | |||
| JP2016197707A | 2016-11-24 | |||
| JPH0980404A | 1997-03-28 | |||
| JP2016074099A | 2016-05-12 | |||
| JP2017175071A | 2017-09-28 |
Attorney, Agent or Firm:
SAKAI INTERNATIONAL PATENT OFFICE (JP)
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