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Patent Searching and Data


Title:
SUBSTRATE SUCTION APPARATUS
Document Type and Number:
WIPO Patent Application WO/2019/024608
Kind Code:
A1
Abstract:
Disclosed is a substrate suction apparatus comprising: a base plate (1), with a gas inlet (12) being provided on the base plate (1), one side of the gas inlet (12) being connected to a negative pressure source (9); and a face plate (3), the face plate (3) being provided on the other side of the gas inlet (12), with several through holes (32) being provided on the face plate (3). The substrate suction apparatus further comprises a gas stream uniform distribution apparatus comprising at least a flow diversion plate (2) provided between the base plate and the face plate, wherein the gas flow passage area of a region on the flow diversion plate (2) near the negative pressure source (9) is smaller than the gas flow passage area of a region on the flow diversion plate (2) away from the negative pressure source (9). In the substrate suction apparatus, the flow diversion plate (2) provided between the face plate and the base plate (1), and a gas flow passage area on the flow diversion plate (2) near the gas inlet (12) is smaller than the gas flow passage area on the flow diversion plate (2) away from the gas inlet (12), avoiding the situation of the suction pressure near the gas inlet (12) being greater than the suction pressure away from the gas inlet (12).

Inventors:
YANG HAIDONG (CN)
JIN ERBIN (CN)
Application Number:
PCT/CN2018/090919
Publication Date:
February 07, 2019
Filing Date:
June 13, 2018
Export Citation:
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Assignee:
JOINT STARS TECH CO LTD (CN)
International Classes:
B25J15/06
Foreign References:
CN107283448A2017-10-24
CN105500094A2016-04-20
CN101637911A2010-02-03
CN103372825A2013-10-30
EP2411191A12012-02-01
JP2016068164A2016-05-09
JPH0715191A1995-01-17
Attorney, Agent or Firm:
NANJING RUIHONG PATENT & TRADEMARK AGENCY (ORDINARY PARTNERSHIP) (CN)
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