SUBSTRATE SUPPORT STAGE OF PLASMA PROCESSING APPARATUS

Title:

SUBSTRATE SUPPORT STAGE OF PLASMA PROCESSING APPARATUS

Document Type and Number:

WIPO Patent Application WO/2010/084650

Kind Code:

A1

Abstract:

Disclosed is a substrate support stage of a plasma processing apparatus, which has a simple structure and prevents an electrical discharge at a connection terminal. Specifically disclosed is a substrate support stage (10) of a plasma processing apparatus, which is arranged in a vacuum chamber and on the upper surface of which an electrostatic chuck (13) that electrostatically attracts a substrate (W) and applies a bias to the substrate (W) is provided. An O-ring (12) is provided on the upper surface of the support stage (10) and the outer periphery side of the O-ring (12) is hermetically sealed as a vacuum chamber, while arranging a common connection terminal (17), which is used for both voltage supply for electrostatic attraction and bias current supply, on the atmosphere side of the inner periphery side of the O-ring (12).

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Inventors:

MATSUDA Ryuichi (MITSUBISHI HEAVY INDUSTRIES LTD., 1-1, Arai-cho Shinhama 2-chome, Takasago-sh, Hyogo 86, 〒6768686, JP)
松田　竜一 (〒86 兵庫県高砂市荒井町新浜２丁目１番１号　三菱重工業株式会社高砂研究所内 Hyogo, 〒6768686, JP)
MATSUKURA Akihiko (MITSUBISHI HEAVY INDUSTRIES LTD., 1-1, Wadasaki-cho 1-chome, Hyogo-ku, Kobe-sh, Hyogo 85, 〒6528585, JP)
松倉　明彦 (〒85 兵庫県神戸市兵庫区和田崎町一丁目１番１号　三菱重工業株式会社神戸造船所内 Hyogo, 〒6528585, JP)

Application Number:

JP2009/067854

Publication Date:

July 29, 2010

Filing Date:

October 15, 2009

Export Citation:

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Assignee:

MITSUBISHI HEAVY INDUSTRIES, LTD. (16-5, Konan 2-chome Minato-k, Tokyo 15, 〒1088215, JP)
三菱重工業株式会社 (〒15 東京都港区港南二丁目１６番５号 Tokyo, 〒1088215, JP)
MATSUDA Ryuichi (MITSUBISHI HEAVY INDUSTRIES LTD., 1-1, Arai-cho Shinhama 2-chome, Takasago-sh, Hyogo 86, 〒6768686, JP)
松田　竜一 (〒86 兵庫県高砂市荒井町新浜２丁目１番１号　三菱重工業株式会社高砂研究所内 Hyogo, 〒6768686, JP)
MATSUKURA Akihiko (MITSUBISHI HEAVY INDUSTRIES LTD., 1-1, Wadasaki-cho 1-chome, Hyogo-ku, Kobe-sh, Hyogo 85, 〒6528585, JP)

International Classes:

C23C16/458; H01L21/205; H01L21/3065; H01L21/31; H01L21/683

Attorney, Agent or Firm:

MITSUISHI Toshiro et al. (Mitsuishi Law and Patent Office, 9-15 Akasaka 1-chome, Minato-k, Tokyo 52, 〒1070052, JP)

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