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Patent Searching and Data


Title:
SUBSTRATE FOR TEST USE, AND METHOD FOR PRODUCING SUBSTRATE FOR TEST USE
Document Type and Number:
WIPO Patent Application WO/2018/225473
Kind Code:
A1
Abstract:
Provided are: a substrate for test use, which can be used suitably in a test such as a culture test; and a method for producing the substrate for test use. A substrate 1 for test use, provided with a base member 5 made from polydimethylsiloxane and a solution-retaining part that is formed on the surface of the base member 5 and can retain water or an aqueous solution, wherein the solution-retaining part has a depressed shape having a hydrophilic surface layer and the largest thickness of the surface layer is 1 μm or more.

Inventors:
KINOSHITA SHINOBU (JP)
IDE TAKASHI (JP)
OYAMA TOMOKO (JP)
TAGUCHI MITSUMASA (JP)
BARBA BIN JEREMIAH DUENAS (JP)
Application Number:
PCT/JP2018/019084
Publication Date:
December 13, 2018
Filing Date:
May 17, 2018
Export Citation:
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Assignee:
IWASAKI ELECTRIC CO LTD (JP)
NATIONAL INSTITUTES FOR QUANTUM AND RADIOLOGICAL SCIENCE AND TECH (JP)
International Classes:
B01L3/00; B01J19/12; C12M3/00
Domestic Patent References:
WO2016140327A12016-09-09
Foreign References:
JP2005539393A2005-12-22
Other References:
KANG, DONG-WOO ET AL.: "Electron Beam-Induced Modification of Poly (dimethyl siloxane)", POLYMER, vol. 35, no. 2, 2011, Korea, pages 157 - 160, XP055562466
YAMAGUCHI, RYO ET AL.: "Evaluation of peel strength of polymethyl methacrylate (PMMA) and polydimethylsiloxane (PDMS) by electron beam irradiation", LECTURE SUMMARIES OF THE FALL LECTURE CONFERENCE (2015) OF THE JAPAN INSTITUTE OF METALS AND MATERIALS, 2015, pages 175
Attorney, Agent or Firm:
KUSHIBUCHI & ASSOCIATES (JP)
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