Title:
SUBSTRATE TREATING DEVICE, SUBSTRATE TREATING METHOD, AND ULTRAVIOLET RAY IRRADIATION UNIT
Document Type and Number:
WIPO Patent Application WO/2022/137725
Kind Code:
A1
Abstract:
This substrate treating device comprises: a treating container that houses a substrate; a gas supply mechanism for supplying an oxygen-containing gas into the treating container; and an ultraviolet ray irradiation unit that emits ultraviolet rays into the treating container and generating oxygen radicals in the treating container. The ultraviolet ray irradiation unit has an ultraviolet ray source that emits ultraviolet rays from the outside of the treating container into the treating container; an ultraviolet ray transmission window through which the ultraviolet rays emitted from the ultraviolet ray source is transmitted into the treating container; and a first optical measuring instrument that measures a light irradiation parameter of the ultraviolet rays transmitted through the ultraviolet ray transmission window and emitted into the treating container.
Inventors:
SHIONO KAI (JP)
KAWASAKI HIROO (JP)
SAITO TETSUYA (JP)
YAMAZAKI KAZUYOSHI (JP)
KAWASAKI HIROO (JP)
SAITO TETSUYA (JP)
YAMAZAKI KAZUYOSHI (JP)
Application Number:
PCT/JP2021/036998
Publication Date:
June 30, 2022
Filing Date:
October 06, 2021
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/316
Foreign References:
| JP2014003150A | 2014-01-09 | |||
| JP2009272595A | 2009-11-19 | |||
| JP2010186815A | 2010-08-26 |
Attorney, Agent or Firm:
TAKAYAMA Hiroshi (JP)
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