Title:
SUBSTRATE TREATMENT APPARATUS AND STORAGE MEDIUM
Document Type and Number:
WIPO Patent Application WO/2017/010191
Kind Code:
A1
Abstract:
A substrate treatment apparatus according to an embodiment of the present invention includes a rotary plate, a treatment-liquid supply part, a ring member, a cover member, and a cleaning-liquid supply part. The rotary plate rotates a substrate. The treatment-liquid supply part supplies treatment liquid to the back surface of the substrate. The ring member has an upper surface including a flat surface and is joined to the rotary plate so as to surround a circumferential edge part of the substrate. The cover member is disposed above the ring member. The cleaning-liquid supply part supplies the cleaning liquid to the flat surface of the ring member.
Inventors:
TOKUNAGA YOICHI (JP)
ZHANG JIAN (JP)
MIZUNO TSUYOSHI (JP)
AMANO YOSHIFUMI (JP)
ITO YUKI (JP)
ZHANG JIAN (JP)
MIZUNO TSUYOSHI (JP)
AMANO YOSHIFUMI (JP)
ITO YUKI (JP)
Application Number:
PCT/JP2016/066804
Publication Date:
January 19, 2017
Filing Date:
June 06, 2016
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/027; H01L21/304
Foreign References:
| JPH105668A | 1998-01-13 | |||
| JP2014130935A | 2014-07-10 | |||
| JP2002319561A | 2002-10-31 | |||
| JP2014123713A | 2014-07-03 | |||
| JPH0766116A | 1995-03-10 |
Attorney, Agent or Firm:
NAGAI Hiroshi et al. (JP)
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