Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
SUBSTRATE TREATMENT APPARATUS
Document Type and Number:
WIPO Patent Application WO/2019/093244
Kind Code:
A1
Abstract:
Provided is a substrate treatment apparatus (1), comprising: a carrier block (3) in which carriers (11) receiving a plurality of wafers W can be placed; a liquid treating unit U1 and a heat treating unit U2 for treating the wafers W; a transfer arm A2 for transferring the wafers W between a carrier and the liquid treating unit U1 or between a carrier and the heat treating unit U2; a casing (10) for housing the liquid treating unit U1, the heat treating unit U2, and the transfer arm A2; an enclosure (20) for housing the casing with a higher airtightness than that of the casing; a first pressure regulating unit (40) that regulates air pressure in the casing; a second pressure regulating unit (50) that regulates air pressure in the enclosure; and a control unit (100) that controls the first pressure regulating unit and the second pressure regulating unit so as to maintain a state in which the atmospheric pressure inside the enclosure is lower than both of the atmospheric pressure outside the enclosure and the atmospheric pressure inside the casing.

More Like This:
Inventors:
KIMURA Yuji (1-1 Fukuhara Koshi Cit, Kumamoto 16, 〒8611116, JP)
SASAKI Ryo (1-1 Fukuhara Koshi Cit, Kumamoto 16, 〒8611116, JP)
KANEKO Shota (1-1 Fukuhara Koshi Cit, Kumamoto 16, 〒8611116, JP)
Application Number:
JP2018/040881
Publication Date:
May 16, 2019
Filing Date:
November 02, 2018
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-ku Tokyo, 25, 〒1076325, JP)
International Classes:
H01L21/027; B05C9/14; B05C11/10; B05C15/00; G03F7/16; H01L21/02; H01L21/677
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (SOEI PATENT AND LAW FIRM, Marunouchi MY PLAZA 9th fl. 1-1, Marunouchi 2-chome, Chiyoda-k, Tokyo 05, 〒1000005, JP)
Download PDF: