Title:
SUBSTRATE TREATMENT APPARATUS
Document Type and Number:
WIPO Patent Application WO/2022/164076
Kind Code:
A1
Abstract:
The present invention relates to a substrate treatment apparatus comprising: a chamber; a substrate support portion which supports at least one substrate in the chamber; a first spray portion which sprays a first gas toward the substrate support portion from the upper side of the substrate support portion; a second spray portion which sprays a second gas toward the substrate support portion from the upper side of the first spray portion; and a buffer portion formed between the first spray portion and the second spray portion, wherein the first spray portion includes a plurality of first spray holes and the second spray portion includes a first supply hole which supplies the first gas to the buffer portion and a second spray hole which passes through the buffer portion. The center of an injection port and the center of a discharge port of the first supply hole are spaced apart from each other in the vertical direction, and the discharge port is formed toward a space among the first spray holes.
Inventors:
LEE JI HUN (KR)
LEE JI WON (KR)
LEE JI WON (KR)
Application Number:
PCT/KR2022/000367
Publication Date:
August 04, 2022
Filing Date:
January 10, 2022
Export Citation:
Assignee:
JUSUNG ENG CO LTD (KR)
International Classes:
H01L21/67; C23C16/455; H01J37/32
Foreign References:
| KR100854995B1 | 2008-08-28 | |||
| JP2019208041A | 2019-12-05 | |||
| KR20090046551A | 2009-05-11 | |||
| KR20110045267A | 2011-05-04 | |||
| US20200173022A1 | 2020-06-04 |
Attorney, Agent or Firm:
ASTRAN INT'L IP GROUP (KR)
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