Title:
SUBSTRATE TREATMENT DEVICE, AIR CONDITIONING METHOD, AND STORAGE MEDIUM
Document Type and Number:
WIPO Patent Application WO/2019/188453
Kind Code:
A1
Abstract:
In the present invention, a coating/developing device 2 comprises: a plurality of accommodation chambers 11a, 12a, 13a, 14a that accommodate a wafer W; a first duct 30 that sends a first gas to each of the plurality of accommodation chambers 11a, 12a, 13a, 14a; a second duct 40 that sends a second gas that has a higher temperature than the first gas to each of the plurality of accommodation chambers 11a, 12a, 13a, 14a; and a plurality of individual air conditioning units 50 that are provided to each of the plurality of accommodation chambers 11a, 12a, 13a, 14a and that adjust the mixture ratio of the first gas discharged from the first duct 30 and the second gas discharged from the second duct 40.
Inventors:
TADOKORO MASAHIDE (JP)
Application Number:
PCT/JP2019/010977
Publication Date:
October 03, 2019
Filing Date:
March 15, 2019
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/027; F26B21/00; G03F7/30
Foreign References:
| JP2000150335A | 2000-05-30 | |||
| JP2010056545A | 2010-03-11 | |||
| JP2006024638A | 2006-01-26 | |||
| JP2017092339A | 2017-05-25 | |||
| JPH11135429A | 1999-05-21 |
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
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