Title:
SUBSTRATE TREATMENT DEVICE, METAL FILM ETCHING METHOD, AND METHOD OF MANUFACTURING MAGNETORESISTIVE ELEMENT
Document Type and Number:
WIPO Patent Application WO/2013/099719
Kind Code:
A1
Abstract:
In order to facilitate replacement of worn dielectric members in a substrate treatment device, this substrate treatment device is provided with a Faraday shield disposed in a position opposite of an antenna with a structural member comprising a dielectric material therebetween, a first dielectric member disposed in a position opposite of the antenna and with the structural member and the Faraday shield therebetween, and a second dielectric member disposed in a position opposite of the antenna and with the structural member, the Faraday shield and the first dielectric member therebetween, wherein the second dielectric member is mounted on a protruding part formed in a vacuum vessel of the substrate treatment device.
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Inventors:
NAKAGAWA YUKITO (JP)
Application Number:
PCT/JP2012/082868
Publication Date:
July 04, 2013
Filing Date:
December 19, 2012
Export Citation:
Assignee:
CANON ANELVA CORP (JP)
International Classes:
H05H1/46; C23F4/00; H01L21/205; H01L21/302; H01L21/3065; H01L21/31; H01L43/12
Domestic Patent References:
| WO2007032379A1 | 2007-03-22 |
Foreign References:
| JP2009129817A | 2009-06-11 | |||
| JP2011146409A | 2011-07-28 | |||
| JP2008109155A | 2008-05-08 | |||
| JP2008305558A | 2008-12-18 | |||
| JP2000133497A | 2000-05-12 | |||
| JPH11251303A | 1999-09-17 | |||
| JP2005535117A | 2005-11-17 | |||
| JP2005042143A | 2005-02-17 | |||
| JP2012009659A | 2012-01-12 | |||
| JP2012138411A | 2012-07-19 |
Attorney, Agent or Firm:
WATANABE Keisuke et al. (JP)
Keisuke Watanabe (JP)
Keisuke Watanabe (JP)
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Claims: