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Patent Searching and Data


Title:
SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2016/151968
Kind Code:
A1
Abstract:
According to the present invention, a substrate pedestal that performs heat transmission with a substrate placed on a placement surface provided in at least one of a temperature raising part and a temperature lowering part formed within a vessel and a temperature control unit that controls the temperature of the substrate pedestal are provided, wherein, when the substrate pedestal is provided in the temperature raising part, the temperature control unit controls the temperature of the substrate pedestal before the substrate is placed on the substrate pedestal such that the substrate to be loaded into a treatment unit can be raised to a predetermined temperature and, when the substrate pedestal is provided in the temperature lowering part, controls the temperature of the substrate pedestal before the substrate is placed on the substrate pedestal such that the treated substrate unloaded from the treatment unit can be lowered to a predetermined temperature.

Inventors:
FUJIKURA Hajime (Hitachi-shi Ibaraki, 18, 〒3191418, JP)
KONNO Taichiro (Hitachi-shi Ibaraki, 18, 〒3191418, JP)
NUMATA Takayuki (Hitachi-shi Ibaraki, 18, 〒3191418, JP)
NEMOTO Shusei (Hitachi-shi Ibaraki, 18, 〒3191418, JP)
Application Number:
JP2015/085830
Publication Date:
September 29, 2016
Filing Date:
December 22, 2015
Export Citation:
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Assignee:
SUMITOMO CHEMICAL COMPANY, LIMITED (27-1, Shinkawa 2-chome Chuo-k, Tokyo 60, 〒1048260, JP)
International Classes:
H01L21/205; C23C16/458; C23C16/46; H01L21/31; H01L21/677
Domestic Patent References:
WO1991009148A11991-06-27
Foreign References:
JPH03132018A1991-06-05
JP2005123284A2005-05-12
JPH0620965A1994-01-28
JP2005085849A2005-03-31
JP2010159463A2010-07-22
JP2007242729A2007-09-20
JPH06275534A1994-09-30
JP2000021788A2000-01-21
JPH11329983A1999-11-30
Attorney, Agent or Firm:
FUKUOKA Masahiro et al. (21 TOWA BLDG. 3F, 6-1 Iidabashi 4-chome, Chiyoda-k, Tokyo 72, 〒1020072, JP)
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