Title:
SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2016/208103
Kind Code:
A1
Abstract:
This substrate treatment device is provided with: a spin chuck (25) that holds a substrate; a treatment liquid supply unit that supplies a first treatment liquid having a first specific gravity, and a second treatment liquid having a second specific gravity, which is smaller than the first specific gravity, to a surface of a substrate (W) held by the spin chuck (25), said surface being to be treated; a recovery tank (53) for storing used first and second treatment liquids after being supplied to the substrate; and a treatment liquid separating mechanism (50A) that separates from each other, on the basis of the specific gravities, the first treatment liquid and the second treatment liquid stored in the recovery tank (53). The first treatment liquid contains an aqueous solution, and the second treatment liquid contains an organic solvent.
Inventors:
TANAKA YUJI (JP)
ASAI MASAYA (JP)
HARUMOTO MASAHIKO (JP)
KANEYAMA KOJI (JP)
ASAI MASAYA (JP)
HARUMOTO MASAHIKO (JP)
KANEYAMA KOJI (JP)
Application Number:
PCT/JP2016/002054
Publication Date:
December 29, 2016
Filing Date:
April 15, 2016
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/027; G03F7/16; G03F7/30
Foreign References:
| JPH1116825A | 1999-01-22 | |||
| JP2014075575A | 2014-04-24 | |||
| JP2011530652A | 2011-12-22 | |||
| JP2005303151A | 2005-10-27 |
Attorney, Agent or Firm:
FUKUSHIMA, Yoshito (JP)
Yoshihito Fukushima (JP)
Yoshihito Fukushima (JP)
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