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Patent Searching and Data


Title:
SUBSTRATE TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/230806
Kind Code:
A1
Abstract:
The present invention relates to a substrate treatment device, and the substrate treatment device for performing a chemical solution coating process on a substrate to be treated comprises: a substrate support part for supporting the substrate; a chemical solution coating unit for coating the substrate with a chemical solution; and a precuring unit for precuring the chemical solution in a state in which the substrate is supported by the substrate support part, thereby preventing the chemical solution from flowing downward and forming a uniform thickness of a chemical solution coating film.

Inventors:
CHO, Kangil (79 Maesongbuk-gil 264beon-gil, Maesong-myeonHwaseong-si, Gyeonggi-do, 18288, KR)
Application Number:
KR2018/001512
Publication Date:
December 20, 2018
Filing Date:
February 05, 2018
Export Citation:
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Assignee:
KCTECH CO.,LTD. (30 Je2gongdan 3-gil, Miyang-myeonAnseong-si, Gyeonggi-do, 17599, KR)
International Classes:
H01L21/67; H01L21/677; H01L21/683; H01L21/687
Foreign References:
KR20110053811A2011-05-24
KR20110058573A2011-06-01
KR20170004503A2017-01-11
KR20110026382A2011-03-15
KR20100137691A2010-12-31
Attorney, Agent or Firm:
KIM, Junyoung (16, Teheran-ro 84-gilGangnam-gu, Seoul, 06178, KR)
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