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Patent Searching and Data


Title:
SUBSTRATE TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/203603
Kind Code:
A1
Abstract:
The present invention relates to a substrate treatment device comprising: a chamber; a first electrode disposed on the top of the chamber; a second electrode disposed on the bottom of the first electrode and including a plurality of openings; a plurality of protruding electrodes extending from the first electrode and extending to the plurality of openings of the second electrode; a substrate support stand which faces the second electrode and on which a substrate is placed; a first discharge region between the bottom surface of the first electrode and the top surface of the second electrode; a second discharge region between the side surface of the protruding electrode and the inner surface of the openings of the second electrode; a third discharge region between the bottom surface of the protruding electrode and the inner surface of the openings of the second electrode; and a fourth discharge region between the second electrode and the substrate, wherein plasma is generated in at least one of the first discharge region to the fourth discharge region.

Inventors:
OH, Woong Kyo (240 Opo-ro, Opo-eupGwangju-si, Gyeonggi-do, 12773, KR)
KIM, Young Woon (240 Opo-ro, Opo-eupGwangju-si, Gyeonggi-do, 12773, KR)
YOO, Kwang Su (240 Opo-ro, Opo-eupGwangju-si, Gyeonggi-do, 12773, KR)
CHO, Won Tae (240 Opo-ro, Opo-eupGwangju-si, Gyeonggi-do, 12773, KR)
Application Number:
KR2019/004734
Publication Date:
October 24, 2019
Filing Date:
April 19, 2019
Export Citation:
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Assignee:
JUSUNG ENGINEERING CO., LTD. (240 Opo-ro, Opo-eupGwangju-si, Gyeonggi-do, 12773, KR)
International Classes:
H01J37/32; C23C16/44; H01L21/02; H01L21/67
Foreign References:
KR20170102778A2017-09-12
KR20140084906A2014-07-07
JP2004238641A2004-08-26
KR101160906B12012-06-28
KR20170136280A2017-12-11
Attorney, Agent or Firm:
ASTRAN INT'L IP GROUP (5th Floor, 233 Yeoksam-ro,,Gangnam-gu, Seoul, 06225, KR)
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