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Patent Searching and Data


Title:
SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/171670
Kind Code:
A1
Abstract:
TMAH, hydrogen peroxide and water are mixed together to prepare an alkaline etching solution which contains TMAH, hydrogen peroxide and water and contains no hydrogen fluoride compound. The etching solution is fed to a substrate in which a polysilicon film and a silicon oxide film are exposed, thereby etching the polysilicon film while preventing the etching of the silicon oxide film.

Inventors:
NEGORO, Sei (1-1, Tenjinkita-machi, Teranouchi-agaru 4-chome, Horikawa-dori, Kamigyo-ku, Kyoto-sh, Kyoto 85, 〒6028585, JP)
KOBAYASHI, Kenji (1-1, Tenjinkita-machi, Teranouchi-agaru 4-chome, Horikawa-dori, Kamigyo-ku, Kyoto-sh, Kyoto 85, 〒6028585, JP)
Application Number:
JP2018/043218
Publication Date:
September 12, 2019
Filing Date:
November 22, 2018
Export Citation:
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Assignee:
SCREEN HOLDINGS CO., LTD. (1-1 Tenjinkita-machi, Teranouchi-agaru 4-chome Horikawa-dori, Kamigyo-ku, Kyoto-sh, Kyoto 85, 〒6028585, JP)
International Classes:
H01L21/308; H01L21/304; H01L21/306; H01L21/336; H01L27/11556; H01L27/11582; H01L29/788; H01L29/792
Foreign References:
US20170141005A12017-05-18
JPH0685206A1994-03-25
JP2013135081A2013-07-08
JP2012238849A2012-12-06
JPH03228330A1991-10-09
JPH09260361A1997-10-03
JP2006054363A2006-02-23
JP2013258391A2013-12-26
JP2008277715A2008-11-13
Attorney, Agent or Firm:
AI ASSOCIATION OF PATENT AND TRADEMARK ATTORNEYS (Sun Mullion NBF Tower, 21st Floor 6-12, Minamihommachi 2-chome, Chuo-ku, Osaka-sh, Osaka 54, 〒5410054, JP)
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