Title:
SUBSTRATE WITH CONDUCTIVE FILM, SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/135468
Kind Code:
A1
Abstract:
Provided is a substrate with a conductive film, which is used for the purpose of producing a reflective mask that is configured such that a positional shift thereof is able to be corrected by a laser beam or the like from the back side. A substrate with a conductive film, which is obtained by forming a conductive film on one surface on a main surface of a substrate for a mask blank to be used in lithography. An intermediate layer having a stress regulation function is provided between the substrate and the conductive film; and the laminate of the intermediate layer and the conductive film has a transmittance of 20% or more with respect to light having a wavelength of 532 nm.
Inventors:
IKEBE YOHEI (JP)
SHOKI TSUTOMU (JP)
SHOKI TSUTOMU (JP)
Application Number:
PCT/JP2018/000961
Publication Date:
July 26, 2018
Filing Date:
January 16, 2018
Export Citation:
Assignee:
HOYA CORP (JP)
International Classes:
G03F1/24; G03F1/26; G03F7/20
Domestic Patent References:
| WO2012026463A1 | 2012-03-01 | |||
| WO2013062104A1 | 2013-05-02 | |||
| WO2012105698A1 | 2012-08-09 |
Foreign References:
| JP2015028999A | 2015-02-12 | |||
| JP2008103481A | 2008-05-01 | |||
| JP2015015420A | 2015-01-22 |
Attorney, Agent or Firm:
TSUKUNI & ASSOCIATES et al. (JP)
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