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Title:
SUBSTRATE WITH FUNCTIONAL FINE LINE AND METHOD FOR FORMING FUNCTIONAL FINE LINE
Document Type and Number:
WIPO Patent Application WO/2018/043046
Kind Code:
A1
Abstract:
Provided are a substrate with a functional fine line, and a method for forming a functional fine line, in which the adhesion of the functional fine line is excellent in optical properties. The substrate with a functional fine line according to the present invention has, on a substrate, an undercoat layer comprising a hydrophobically modified polyester resin, and has, on the undercoat layer, a functional fine line comprising a deposit of functional microparticles and having a line width of 1-10 μm. In the method for forming a functional fine line according to the present invention, an undercoat layer comprising a hydrophobically modified polyester resin is formed on a substrate, and a functional fine line comprising a deposit of functional microparticles and having a line width of 1-10 μm is next formed on the undercoat layer.

Inventors:
YAMAUCHI Masayoshi (Inc. 2-7-2, Marunouchi, Chiyoda-k, Tokyo 15, 〒1007015, JP)
OHYA Hidenobu (Inc. 2-7-2, Marunouchi, Chiyoda-k, Tokyo 15, 〒1007015, JP)
OMATA Takenori (Inc. 2-7-2, Marunouchi, Chiyoda-k, Tokyo 15, 〒1007015, JP)
NIIZUMA Naoto (Inc. 2-7-2, Marunouchi, Chiyoda-k, Tokyo 15, 〒1007015, JP)
Application Number:
JP2017/028604
Publication Date:
March 08, 2018
Filing Date:
August 07, 2017
Export Citation:
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Assignee:
KONICA MINOLTA, INC. (2-7-2, Marunouchi Chiyoda-k, Tokyo 15, 〒1007015, JP)
International Classes:
B32B3/14; B32B27/36; H01B5/14; H01B13/00; H01L51/50; H05B33/02; H05B33/10; H05B33/22; H05B33/26; H05B33/28; H05K3/24
Domestic Patent References:
WO2014030647A12014-02-27
WO2017104651A12017-06-22
WO2016143715A12016-09-15
Foreign References:
JP2010026000A2010-02-04
JP2015155086A2015-08-27
JP2008028164A2008-02-07
Attorney, Agent or Firm:
SHIN-YU INTERNATIONAL PATENT FIRM (Sasazuka Center Bldg, 2-1-6 Sasazuka, Shibuya-k, Tokyo 73, 〒1510073, JP)
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