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Patent Searching and Data


Title:
SUBSTRATE WITH THIN FILM AND PRODUCTION METHOD THEREOF
Document Type and Number:
WIPO Patent Application WO/2019/189109
Kind Code:
A1
Abstract:
The present invention provides a substrate with a thin film having a beautiful appearance. This substrate with a thin film is provided with a substrate and a thin film containing SiO2 as a main component and covering at least a part of the substrate surface. The thin film has a physical film thickness of 5 nm to 500 nm. There are two points where ∆E* is 2 or less on the surface of the thin film. ∆E* is a value determined on the basis of the difference ∆L* of the L* value in the L*a*b* color system, the difference ∆a* of the a* value and the difference ∆b* of the b* value between the two points from the following equation (1). (1): ΔE* = {(ΔL*)2 + (Δa*)2 + (Δb*)2}1/2

Inventors:
YAMAMOTO Toru (Limited 5-27, Mita 3-chome, Minato-k, Tokyo 21, 〒1086321, JP)
Application Number:
JP2019/012737
Publication Date:
October 03, 2019
Filing Date:
March 26, 2019
Export Citation:
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Assignee:
NIPPON SHEET GLASS COMPANY, LIMITED (5-27, Mita 3-chome Minato-k, Tokyo 21, 〒1086321, JP)
International Classes:
C03C17/25; B32B7/023; C03C17/34; C09D1/00; C09D7/20; C09D183/02
Domestic Patent References:
WO2005050675A12005-06-02
WO2002004376A12002-01-17
Foreign References:
JP2016185886A2016-10-27
JP2017119595A2017-07-06
JPH09165232A1997-06-24
JP2015164798A2015-09-17
JP2012230200A2012-11-22
Attorney, Agent or Firm:
KAMADA Koichi (8th Fl, UMEDA PLAZA BLDG. ANNEX 4-3-25, Nishitenma, Kita-ku, Osaka-sh, Osaka 47, 〒5300047, JP)
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