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Patent Searching and Data


Title:
SUBSTRATE WITH TRANSPARENT ELECTRODE AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2013/111681
Kind Code:
A1
Abstract:
The present invention relates to a substrate with a transparent electrode, which has a transparent electrode layer on at least one surface of a transparent film base. The transparent film base has a transparent dielectric layer, which is mainly formed of an oxide, on the transparent electrode layer-side surface. In one embodiment of the present invention, the transparent electrode layer is a crystalline transparent electrode layer that has a crystallization degree of 80% or more. In this embodiment, the crystalline transparent electrode layer has a resistivity of 3.5 × 10-4 Ω·cm or less, a film thickness of 15-40 nm, an indium oxide content of 87.5-95.5% and a carrier density of from 4 × 1020 /cm3 to 9 × 1020 /cm3, and the substrate with a transparent electrode preferably has a thermal shrinkage initiation temperature of 75-120˚C as determined by thermomechanical analysis.

Inventors:
KUCHIYAMA TAKASHI (JP)
HAYAKAWA HIRONORI (JP)
UEDA HIROAKI (JP)
FUJIMOTO TAKAHISA (JP)
YAMAMOTO KENJI (JP)
Application Number:
PCT/JP2013/050923
Publication Date:
August 01, 2013
Filing Date:
January 18, 2013
Export Citation:
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Assignee:
KANEKA CORP (JP)
International Classes:
B32B9/00; H01B5/14; C23C14/34; C23C14/58; H01B13/00
Foreign References:
JP2003297150A2003-10-17
JP2005011737A2005-01-13
JP2005007627A2005-01-13
Other References:
"Study of influence of under layer On ITO Crystallization", DAI 68 KAI EXTENDED ABSTRACTS, vol. 2, 4 September 2007 (2007-09-04), pages 621
Attorney, Agent or Firm:
SHINTAKU, Masato et al. (JP)
Masahito Shintaku (JP)
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Claims: