Title:
SULFONATE DERIVATIVES AND THE USE THEROF AS LATENT ACIDS
Document Type and Number:
WIPO Patent Application WO2003067332
Kind Code:
A3
Abstract:
Chemically amplified photoresist compositions comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) a compound of the formula (Ia), (Ib), (IIa), (IIb), (IIIa), (IIIb), (Iva), (Ivb), (Va), (Vb) or (VIa), wherein n is 1 or 2; m is 0 or 1; X0 is -[CH2]h-X or -CH=CH2; h is 2, 3, 4, 5 or 6; R1 when n is 1, is for example optionally substituted phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl; R1, when n is 2, is for example optionally substituted phenylene or naphthylene; R2 for example has one of the meanings of R1; X is for example -OR20, -NR21R22, -SR23; X' is -X1-A3-X2-; X1 and X2 are for example -O-, -S- or a direct bond; A3 is e.g. phenylene; R3 has for example one of the meanings given for R1; R4 has for example one of the meaning given for R2; R5 and R6 e.g. are hydrogen; G i.a. is -S- or -O-; R7 when n is 1, e.g. is phenyl, optionally substituted, when n is 2, is for example phenylene; R8 and R9 e.g. are C1-C18alkyl; R10 has one of the meanings given for R7; R11 i.a. is C1-C18alkyl; R12, R13, R14, R15 R16, R17 and R18 for example are hydrogen or C1-C18alkyl; R20, R21, R22 and R23 i.a. are phenyl or C1-C18alkyl; give high resolution with good resist profile.
Inventors:
MATSUMOTO AKIRA (JP)
YAMATO HITOSHI (JP)
ASAKURA TOSHIKAGE (JP)
MURER PETER (CH)
YAMATO HITOSHI (JP)
ASAKURA TOSHIKAGE (JP)
MURER PETER (CH)
Application Number:
PCT/EP2003/000821
Publication Date:
December 24, 2003
Filing Date:
January 28, 2003
Export Citation:
Assignee:
CIBA SC HOLDING AG (CH)
MATSUMOTO AKIRA (JP)
YAMATO HITOSHI (JP)
ASAKURA TOSHIKAGE (JP)
MURER PETER (CH)
MATSUMOTO AKIRA (JP)
YAMATO HITOSHI (JP)
ASAKURA TOSHIKAGE (JP)
MURER PETER (CH)
International Classes:
C07C301/00; C07C309/67; C07C309/68; C07C317/04; C07C317/14; C07C323/66; C07C381/00; C07D209/48; C07D209/76; C07D291/00; C07D333/36; G02B5/20; G03F7/00; G03F7/004; G03F7/038; G03F7/039; H01L21/027; G03F7/075; (IPC1-7): G03F7/004; C07D291/00; C07C301/00
Foreign References:
US5714625A | 1998-02-03 |
Download PDF:
Previous Patent: RADIATION PATTERNING TOOLS, AND METHODS OF FORMING RADIATION PATTERNING TOOLS
Next Patent: POLARISATION-OPTIMISED ILLUMINATION SYSTEM
Next Patent: POLARISATION-OPTIMISED ILLUMINATION SYSTEM