Title:
SULFONIC ACID DERIVATIVE COMPOUND, PHOTOACID GENERATOR, RESIST COMPOSITION, CATIONIC POLYMERIZATION INITIATOR, AND CATIONICALLY POLYMERIZABLE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2016/147357
Kind Code:
A1
Abstract:
Provided are: a sulfonic acid derivative compound that has high absorbance with respect to light having a wavelength of 365 nm, that has high solubility in an organic solvent, and that exhibits a good acid generation rate; a photoacid generator; a resist composition; a cationic polymerization initiator; and a cationically polymerizable composition. The sulfonic acid derivative compound is represented by general formula (I) (in formula (I), X represents a linear or branched alkyl group having 1-14 carbon atoms and R represents an aliphatic hydrocarbon group having 1-18 carbon atoms, an aryl group having 6-20 carbon atoms, an aryl alkyl group having 7-20 carbon atoms, an aryl group that has 7-20 carbon atoms and that is substituted by an acyl group, an alicyclic hydrocarbon group having 3-12 carbon atoms, a 10-camphor-yl group, or the like).
Inventors:
YANAGISAWA SATOSHI (JP)
KIMURA MASAKI (JP)
TODA HITOMI (JP)
SHIGENO KOICHI (JP)
KIMURA MASAKI (JP)
TODA HITOMI (JP)
SHIGENO KOICHI (JP)
Application Number:
PCT/JP2015/058120
Publication Date:
September 22, 2016
Filing Date:
March 18, 2015
Export Citation:
Assignee:
ADEKA CORP (JP)
International Classes:
C07D221/14; C08G59/38; G03F7/004
Domestic Patent References:
| WO2015001804A1 | 2015-01-08 | |||
| WO2011087011A1 | 2011-07-21 | |||
| WO2014084269A1 | 2014-06-05 |
Foreign References:
| JP2004217748A | 2004-08-05 | |||
| US20130134426A1 | 2013-05-30 |
Other References:
See also references of EP 3272737A4
Attorney, Agent or Firm:
HONDA ICHIRO (JP)
Ichiro Honda (JP)
Ichiro Honda (JP)
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