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Title:
SULFONIUM SALT, PHOTO-ACID GENERATOR, AND PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2010/095385
Kind Code:
A1
Abstract:
A sulfonium salt which is highly sensitive to i-line. The sulfonium salt is represented by formula (1). [In formula (1), R1 to R6 each independently represents an alkyl, hydroxy, an alkoxy, an alkylcarbonyl, an arylcarbonyl, an alkoxycarbonyl, an aryloxycarbonyl, an arylthiocarbonyl, an acyloxy, an arylthio, an alkylthio, an aryl, a heterocyclic hydrocarbon group, an aryloxy, an alkylsulfinyl, an arylsulfinyl, an alkylsulfonyl, an arylsulfonyl, a hydroxy(poly)alkyleneoxy, optionally substituted amino, cyano, nitro, or a halogen atom; m1 to m6 respectively indicate the number of R1s to the number of R6s; m1, m4, and m6 each is an integer of 0-5; m2, m3, and m5 each is an integer of 0-4; and X- represents a monovalent polyatomic anion.]

Inventors:
SUZUKI ISSEI (JP)
KIMURA HIDEKI (JP)
Application Number:
PCT/JP2010/000683
Publication Date:
August 26, 2010
Filing Date:
February 04, 2010
Export Citation:
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Assignee:
SAN APRO LTD (JP)
SUZUKI ISSEI (JP)
KIMURA HIDEKI (JP)
International Classes:
C07C381/12; C08F2/50; C08G59/68; G03F7/004; G03F7/038; G03F7/039; C08L25/00; C08L33/00; C08L61/00
Domestic Patent References:
WO2008117619A12008-10-02
Foreign References:
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See also references of EP 2399905A4
Attorney, Agent or Firm:
HAYASHI, HIROSHI (JP)
Hiroshi Hayashi (JP)
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