SULFURIC ACID COMPOSITION HAVING LOW SURFACE TENSION

Title:

SULFURIC ACID COMPOSITION HAVING LOW SURFACE TENSION

Document Type and Number:

WIPO Patent Application WO/1990/010730

Kind Code:

A1

Abstract:

A surfactant of the general formula: R1SO2NR2C2H4OA (wherein R1 represents a fluoroalkyl group, R2 represents H or a lower alkyl group, and A represents H or SO3H) is added to a cleaning liquid comprising sulfuric acid or sulfuric acid-hydrogen peroxide, used in the semiconductor industry or the like, to lower the surface tension, thus improving the wettability and enhancing the cleaning effect.

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Inventors:

MORI KIYOTO (JP)
SHIHOYA TAKAO (JP)
HARA HISAO (JP)

Application Number:

PCT/JP1990/000345

Publication Date:

September 20, 1990

Filing Date:

March 15, 1990

Export Citation:

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Assignee:

HARA MISAKO & HM (JP)
HARA ERIKO & HM (JP)
NISSAN CHEMICAL IND LTD (JP)
KANTO KAGAKU (JP)

International Classes:

C09D9/00; C09K13/08; C11D1/00; C23F1/16; C23G1/02; H01L21/304; H01L21/306; (IPC1-7): C23F1/24

Foreign References:

JPH06345461B
JPS62109985A	1987-05-21

Other References: