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Title:
SUPERCONDUCTING WIRE AND SUPERCONDUCTING COIL EMPLOYING IT
Document Type and Number:
WIPO Patent Application WO/2005/008687
Kind Code:
A1
Abstract:
A tape-like superconducting wire produced by forming a superconducting thin film on the surface of a substrate in which AC loss can be suppressed by making slits at least in the superconducting thin film part thereby forming electrically isolated parallel conductors on a plurality of superconducting thin film parts having rectangular cross-sections. A superconducting coil formed by winding the superconducting wire has such an arrangement in the structure or placement of the superconducting coil that it is provided, at least partially, with a part where vertical interlinking fluxes acting between the conductor elements of the parallel conductors through a field distribution generated by the superconducting coil cancel each other. Consequently, interlinking flux by the vertical field to the wire can be canceled through a simple arrangement having no dislocation, and current distribution can be made uniform by suppressing a circulation current in the wire induced by the vertical field. Consequently, a low loss superconducting coil can be provided.

Inventors:
FUNAKI KAZUO (JP)
IWAKUMA MASATAKA (JP)
KISU TAKANOBU (JP)
TOMIOKA AKIRA (JP)
UEDE TOSHIO (JP)
FUJI HIROSHI (JP)
IZUMI TERUO (JP)
SHIOBRA YUH (JP)
Application Number:
PCT/JP2004/009965
Publication Date:
January 27, 2005
Filing Date:
July 13, 2004
Export Citation:
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Assignee:
FUJI ELECTRIC SYSTEMS CO LTD (JP)
INT SUPERCONDUCTIVITY TECH (JP)
FUJIKURA LTD (JP)
FUNAKI KAZUO (JP)
IWAKUMA MASATAKA (JP)
KISU TAKANOBU (JP)
TOMIOKA AKIRA (JP)
UEDE TOSHIO (JP)
FUJI HIROSHI (JP)
IZUMI TERUO (JP)
SHIOBRA YUH (JP)
International Classes:
H01F6/02; H01F6/06; H01F27/28; H01F27/34; (IPC1-7): H01B12/06; H01B13/00; H01F6/06; H02K55/00
Foreign References:
JP2001110256A2001-04-20
JPS63269422A1988-11-07
JP2001110256A2001-04-20
Other References:
See also references of EP 1653485A4
Attorney, Agent or Firm:
Yamguchi, Iwao c/o Yamaguchi International Patent Office (3-2 Higashigotanda 2-chom, Shinagawa-ku Tokyo 22, JP)
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