Title:
SUPPLY METHOD, SUPPLY DEVICE, AND DETERGENT
Document Type and Number:
WIPO Patent Application WO/2022/091451
Kind Code:
A1
Abstract:
A sponge cleaning device 200 comprises: a sponge cleaning tank 210; a sponge 220 capable of retaining a detergent LQ2 (liquid substance); a sample retention structure 230 for retaining a model material MD (sample); a movement mechanism 240 capable of moving the sample retention structure 230 freely back and forth with respect to the sponge 220; a detergent supply mechanism 250 for supplying the detergent LQ2 to the sponge cleaning tank 210; a rinse supply mechanism 260 for supplying a rinse solution LQ5 to the sponge cleaning tank 210; a waste liquid holding tank 270 for holding wastewater from the sponge cleaning tank 210; a liquid surface sensor 280 provided to the sponge cleaning tank 210; and a control mechanism 290 for controlling the mechanisms 240-260.
Inventors:
NEMOTO TATSUHIRO (JP)
KONDOH YUTAKA (JP)
KURIYAMA YUKA (JP)
KONDOH YUTAKA (JP)
KURIYAMA YUKA (JP)
Application Number:
PCT/JP2021/014879
Publication Date:
May 05, 2022
Filing Date:
April 08, 2021
Export Citation:
Assignee:
KEIYO CHEMICAL CO LTD (JP)
International Classes:
B08B3/08; B29C64/106; B29C64/35; B29C64/40; B33Y10/00; B33Y30/00; B33Y40/20
Foreign References:
| JPH0699149A | 1994-04-12 | |||
| JPS5074175U | 1975-06-28 | |||
| JP2019089323A | 2019-06-13 | |||
| JPS62190686U | 1987-12-04 | |||
| JPS61249583A | 1986-11-06 | |||
| JPH06296939A | 1994-10-25 | |||
| JP2004024926A | 2004-01-29 | |||
| JP2016082195A | 2016-05-16 | |||
| JP2012199407A | 2012-10-18 |
Attorney, Agent or Firm:
KAMEYAMA Natsuki (JP)
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