Title:
SUPPORT FOR FORMING HYDROGEN DISCHARGE FILM, AND LAMINATED HYDROGEN DISCHARGE FILM
Document Type and Number:
WIPO Patent Application WO/2017/104569
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: a support for forming a hydrogen discharge film, which does not easily break when pressure is applied, and which exhibits excellent pressure-resistant airtightness; and a laminated hydrogen discharge film which uses said support. This support for forming a hydrogen discharge film is used in order to form a hydrogen discharge film including a metal layer, and is characterized in that: the support is a porous body; the porous body has an average pore size in a cross-sectional portion extending 4 µm in the thickness direction from the surface at the side where the hydrogen discharge film is formed of 30-100 nm; and the porous body has a maximum pore size in a cross-sectional portion extending 8 µm in the thickness direction from the surface at the side where the hydrogen discharge film is formed of not more than 2 µm.
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Inventors:
HARADA NORIAKI (JP)
FUKUOKA TAKAHIRO (JP)
FUJIWARA KEIKO (JP)
ISHII KYOKO (JP)
MASAKI SHUNSUKE (JP)
FUKUOKA TAKAHIRO (JP)
FUJIWARA KEIKO (JP)
ISHII KYOKO (JP)
MASAKI SHUNSUKE (JP)
Application Number:
PCT/JP2016/086717
Publication Date:
June 22, 2017
Filing Date:
December 09, 2016
Export Citation:
Assignee:
NITTO DENKO CORP (JP)
International Classes:
B01D69/10; B01D53/22; B01D71/02; B01D71/34; B01D71/64; B01D71/68; B32B5/24; B32B15/08; H01G9/12; H01G11/14; H01M2/12
Foreign References:
| JP2005254191A | 2005-09-22 | |||
| JP2014058433A | 2014-04-03 | |||
| JPS59209610A | 1984-11-28 | |||
| JP2005502158A | 2005-01-20 | |||
| JP2015053475A | 2015-03-19 | |||
| JP2001029760A | 2001-02-06 | |||
| JP2003297325A | 2003-10-17 | |||
| JPS55127124A | 1980-10-01 | |||
| JP2000005580A | 2000-01-11 | |||
| JP2008012495A | 2008-01-24 | |||
| JPH06254361A | 1994-09-13 |
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (JP)
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