Title:
SUPPORT FRAME FOR PELLICLES, PELLICLE, AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2018/055994
Kind Code:
A1
Abstract:
The present invention provides a support frame for pellicles that has both low dusting characteristics and high light fastness and the ion elution amount of which is reduced to the utmost limit to an extent that noise is not generated even when a short wavelength laser is used for an exposure light source, a pellicle using the support frame for pellicles, and a method for efficiently manufacturing same. A support frame for pellicles characterized by having a frame bar comprising aluminum or aluminum alloy and an inorganic coating layer formed on the surface of the frame bar, the principal chain of the inorganic coating layer being constituted by a -Si-O-Si-O- bond. It is preferable that an anodic oxide film be formed between the frame bar and the inorganic coating layer.
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Inventors:
YAMAGUCHI TAKAYUKI (JP)
Application Number:
PCT/JP2017/030943
Publication Date:
March 29, 2018
Filing Date:
August 29, 2017
Export Citation:
Assignee:
NIPPON LIGHT METAL CO (JP)
International Classes:
C25D11/18; G03F1/64
Domestic Patent References:
| WO2011007523A1 | 2011-01-20 |
Foreign References:
| JP2014109748A | 2014-06-12 | |||
| JP2013007762A | 2013-01-10 | |||
| JP2012068667A | 2012-04-05 | |||
| JP2009169380A | 2009-07-30 | |||
| JP2010237282A | 2010-10-21 | |||
| JPH0743892A | 1995-02-14 |
Other References:
See also references of EP 3518038A4
Attorney, Agent or Firm:
NAKA, Koichi et al. (JP)
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