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Patent Searching and Data


Title:
SUPPORT MODULE FOR LITHOGRAPHY SYSTEM
Document Type and Number:
WIPO Patent Application WO/2013/039401
Kind Code:
A4
Abstract:
The invention relates to a support structure and support module, for instance for use in a lithography system, comprising a frame and a support for supporting a load, wherein said support is moveable relative to said frame, said support structure further comprising a force compensation spring assembly connecting said support to said frame for at least partially supporting said support and/or said load, wherein said force compensation spring assembly comprises a first spring having a negative stiffness characteristic over a predefined range of motion of said spring, and a second spring having a positive stiffness.

Inventors:
DUNNING ALJE GEERT (NL)
Application Number:
NL2012/050653
Publication Date:
May 30, 2013
Filing Date:
September 17, 2012
Export Citation:
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Assignee:
MAPPER LITHOGRAPHY IP B.V. (Computerlaan 15, XK Delft, NL-2628, NL)
International Classes:
F16F3/02; F16F15/073
Attorney, Agent or Firm:
VAN DE WAL, Barend, Willem (Octrooibureau Vriesendorp & Gaade B.V, Dr. Kuyperstraat 6, BB Den Haag, NL-2514, NL)
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