Title:
SUPPORT SUBSTRATE FOR RADIOISOTOPE PRODUCTION, TARGET PLATE FOR RADIOISOTOPE PRODUCTION, AND PRODUCTION METHOD FOR SUPPORT SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2017/183697
Kind Code:
A1
Abstract:
Provided is a target plate for radioisotope production, that is capable of reducing the degree of radiation and has sufficient durability and heat resistance when being used in radioisotope production. In the target plate (10) for radioisotope production, a support substrate (2) supporting a target (1) has a graphite film. The thermal conductivity of the graphite film, in the film surface direction, is at least 1,200 W/(m·K) and the thickness of the graphite film is 0.05-100 µm.
Inventors:
MURAKAMI MUTSUAKI (JP)
TATAMI ATSUSHI (JP)
TACHIBANA MASAMITSU (JP)
TATAMI ATSUSHI (JP)
TACHIBANA MASAMITSU (JP)
Application Number:
PCT/JP2017/015932
Publication Date:
October 26, 2017
Filing Date:
April 20, 2017
Export Citation:
Assignee:
KANEKA CORP (JP)
International Classes:
G21K5/08; C01B32/205; C01B32/21; G21G1/10; G21G4/08
Foreign References:
| JP2013216577A | 2013-10-24 | |||
| JP2008501612A | 2008-01-24 | |||
| JP2004535288A | 2004-11-25 | |||
| JP2014517258A | 2014-07-17 | |||
| JP2013525744A | 2013-06-20 | |||
| JP2004535288A | 2004-11-25 | |||
| JP2008501612A | 2008-01-24 | |||
| JP2013238515A | 2013-11-28 | |||
| JP2999381B2 | 2000-01-17 |
Other References:
See also references of EP 3447774A4
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (JP)
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