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Title:
SURFACE MODIFICATION METHOD, SURFACE-MODIFIED MATERIAL, AND POLYMERIZATION LIQUID
Document Type and Number:
WIPO Patent Application WO/2015/163383
Kind Code:
A1
Abstract:
One embodiment of the present invention has: a step for introducing an amino group or hydroxyl group to the surface of a solid; a step for reacting the solid, to the surface of which the amino group or hydroxyl group has been introduced, with a 2-bromo-2-methylpropionic acid derivative, introducing a 2-bromoisobutyryl group to the surface of the solid; and a step for, in air, immersing the solid, to the surface of which a 2-bromoisobutyryl group has been introduced, in a polymerization liquid containing a water-soluble monomer, water, an ATRP catalyst metal salt, an ATRP catalyst ligand, and a reducing agent, and using an AGET ATRP method or an ARGET ATRP method, introducing to the surface of the solid a polymer brush by means of polymerizing the water-soluble monomer. The water-soluble monomer is (meth)acrylic acid, 2-dimethylaminoethyl (meth)acrylate, 2-diethylaminoethyl (meth)acrylate, 1,2-dihydroxyethyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-(meth)acryloyloxyethylphosphorylcholine, [2-(meth)acryloyloxyethyl]dimethyl(3-sulfopropyl)ammonium hydroxide, (meth)acrylamide, N-2-dimethylaminoethyl(meth)acrylamide, N-2-diethylaminoethyl(meth)acrylamide, N-1,2-dihdroxyethyl(meth)acrylamide, or N-2-hydroxyethyl(meth)acrylamide.

Inventors:
DUNDERDALE, Gary (National Institute of Advanced Industrial Science and Technology 2266-98, Aza-Anagahora, Oaza-Shimoshidami, Moriyama-Ku, Nagoya-Sh, Aichi 60, 〒4638560, JP)
HOZUMI, Atsushi (National Institute of Advanced Industrial Science and Technology 2266-98, Aza-Anagahora, Oaza-Shimoshidami, Moriyama-Ku, Nagoya-Sh, Aichi 60, 〒4638560, JP)
URATA, Chihiro (National Institute of Advanced Industrial Science and Technology 2266-98, Aza-Anagahora, Oaza-Shimoshidami, Moriyama-Ku, Nagoya-Sh, Aichi 60, 〒4638560, JP)
Application Number:
JP2015/062305
Publication Date:
October 29, 2015
Filing Date:
April 22, 2015
Export Citation:
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Assignee:
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (3-1 Kasumigaseki 1-Chome, Chiyoda-Ku Tokyo, 21, 〒1008921, JP)
DUNDERDALE, Gary (National Institute of Advanced Industrial Science and Technology 2266-98, Aza-Anagahora, Oaza-Shimoshidami, Moriyama-Ku, Nagoya-Sh, Aichi 60, 〒4638560, JP)
HOZUMI, Atsushi (National Institute of Advanced Industrial Science and Technology 2266-98, Aza-Anagahora, Oaza-Shimoshidami, Moriyama-Ku, Nagoya-Sh, Aichi 60, 〒4638560, JP)
URATA, Chihiro (National Institute of Advanced Industrial Science and Technology 2266-98, Aza-Anagahora, Oaza-Shimoshidami, Moriyama-Ku, Nagoya-Sh, Aichi 60, 〒4638560, JP)
International Classes:
C08F2/00; C08F2/38; C08F292/00
Domestic Patent References:
WO2012091169A12012-07-05
Foreign References:
JP2010047452A2010-03-04
Other References:
B.T. CHEESMAN ET AL.: "Effect of Colloidal Substrate Curvature on pH- Responsive Polyelectrolyte Brush Growth", LANGMUIR, vol. 29, 25 April 2013 (2013-04-25), pages 6131 - 6140, XP055233076
Attorney, Agent or Firm:
ITOH, Tadashige et al. (16th Floor, Marunouchi MY PLAZA 1-1, Marunouchi 2-chome, Chiyoda-k, Tokyo 05, 〒1000005, JP)
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