Title:
SURFACE-MODIFIED COLLOIDAL CERIA ABRASIVE PARTICLES, PREPARATION METHOD THEREFOR, AND POLISHING SLURRY COMPOSITION CONTAINING SAME
Document Type and Number:
WIPO Patent Application WO/2018/048068
Kind Code:
A1
Abstract:
The present invention relates to surface-modified colloidal ceria abrasive particles, a preparation method therefor, and a polishing slurry composition containing the same. According to one embodiment of the present invention, the surface-modified colloidal ceria abrasive particles comprise: colloidal ceria abrasive particles; and cerium atoms and hydroxyl groups (-OH) formed on the surface of the colloidal ceria abrasive particles.
Inventors:
CHOI NAK HYUN (KR)
PARK KWANG SOO (KR)
KIM JUNG YOON (KR)
HWANG JUN HA (KR)
PARK KWANG SOO (KR)
KIM JUNG YOON (KR)
HWANG JUN HA (KR)
Application Number:
PCT/KR2017/006497
Publication Date:
March 15, 2018
Filing Date:
June 21, 2017
Export Citation:
Assignee:
K C TECH CO LTD (KR)
International Classes:
C09K3/14; C01F17/235; C09G1/02
Domestic Patent References:
| WO2004009726A1 | 2004-01-29 |
Foreign References:
| KR20100004181A | 2010-01-13 | |||
| KR20150014961A | 2015-02-09 | |||
| KR20110068973A | 2011-06-22 | |||
| JP2015229750A | 2015-12-21 |
Attorney, Agent or Firm:
MUHANN PATENT & LAW FIRM (KR)
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