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Title:
SURFACE TREATMENT APPARATUS AND SURFACE TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2022/172747
Kind Code:
A1
Abstract:
Provided is a surface treatment apparatus comprising: a levitation conveying means that has a gas ejection member capable of ejecting gas from an ejection port on the outer peripheral surface, an edge ring pair, each ring being arranged at a respective axial end of the outer peripheral surface of the gas ejection member and having an outer peripheral surface protruding with respect to the outer peripheral surface of the gas ejection member, and a drive unit for rotating the edge ring pair; and a surface treatment means, wherein the levitation conveying means is used to cause the first surface of a base material to levitate above the outer peripheral surface of the gas ejection member, to bring both ends of the first surface of the base material into contact with the outer peripheral surfaces of the edge ring pair, and to convey the base material along the outer peripheral surfaces of the rotating edge ring pair while curving the base material, and the surface treatment means is used to perform surface treatment of the second surface of the base material curved along the outer peripheral surfaces of the edge ring pair. Provided also is a surface treatment method using the surface treatment apparatus.

Inventors:
YOSHIDA RYUHEI (JP)
Application Number:
PCT/JP2022/002715
Publication Date:
August 18, 2022
Filing Date:
January 25, 2022
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
B65H27/00; B65H20/10
Foreign References:
JP2011147864A2011-08-04
JP2006255492A2006-09-28
JP2012086212A2012-05-10
JP2014000505A2014-01-09
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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