Title:
SURFACE TREATMENT COMPOSITION AND SURFACE TREATMENT METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2024/053819
Kind Code:
A1
Abstract:
The present invention relates to a surface treatment composition comprising hydrofluosilicic acid (H2SiF6) and hydrofluoric acid (HF), and a surface treatment method using same. The composition can be used for processing (for example, etching) of a substrate such as glass.
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Inventors:
HONG HYEUNWOONG (KR)
KWON WOOHYEOP (KR)
AHN HYEONGEUN (KR)
JUNG WOOIN (KR)
KANG DONGKYEONG (KR)
KIM DONGHYUN (KR)
KIM TAEHEON (KR)
KIM HYUNJEONG (KR)
LEE CHANGSU (KR)
JEON KANGYEOB (KR)
MOON JUNGHEUN (KR)
MOON CHULHWAN (KR)
WOO BYUNGWON (KR)
LEE JUNGEUN (KR)
LEE JUNHEE (KR)
LEE TAESEOK (KR)
JEONG HYEJEONG (KR)
HONG KANGSAN (KR)
JOUNG SOONKIL (KR)
KWON WOOHYEOP (KR)
AHN HYEONGEUN (KR)
JUNG WOOIN (KR)
KANG DONGKYEONG (KR)
KIM DONGHYUN (KR)
KIM TAEHEON (KR)
KIM HYUNJEONG (KR)
LEE CHANGSU (KR)
JEON KANGYEOB (KR)
MOON JUNGHEUN (KR)
MOON CHULHWAN (KR)
WOO BYUNGWON (KR)
LEE JUNGEUN (KR)
LEE JUNHEE (KR)
LEE TAESEOK (KR)
JEONG HYEJEONG (KR)
HONG KANGSAN (KR)
JOUNG SOONKIL (KR)
Application Number:
PCT/KR2023/007324
Publication Date:
March 14, 2024
Filing Date:
May 26, 2023
Export Citation:
Assignee:
SAMSUNG ELECTRONICS CO LTD (KR)
FOOSUNG CO LTD (KR)
FOOSUNG CO LTD (KR)
International Classes:
C03C15/00; C09K13/02; C09K13/04; C09K13/08
Foreign References:
| JP2017081767A | 2017-05-18 | |||
| KR20120125269A | 2012-11-14 | |||
| KR20150113621A | 2015-10-08 | |||
| KR101512213B1 | 2015-04-14 | |||
| CN104488068A | 2015-04-01 |
Attorney, Agent or Firm:
PENTAS INTELLECTUAL PROPERTY LAW FIRM (KR)
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