Title:
SURFACE TREATMENT COMPOSITION, PRODUCTION METHOD THEREFOR, SURFACE TREATMENT METHOD USING SURFACE TREATMENT COMPOSITION, AND PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2018/163781
Kind Code:
A1
Abstract:
[Problem] To provide a means for sufficiently removing residue remaining on the surface of a polished object-to-be-polished. [Solution] A surface treatment composition containing a polymer compound and water and having a pH of less than 7, said polymer compound having: at least one type of ionic functional group selected from the group consisting of a sulfonic acid (salt) group, a phosphoric acid (salt) group, a phosphonic acid (salt) group, and an amino group; a pKa of no more than 3; and an ionic functional group density of more than 10%.
Inventors:
ISHIDA YASUTO (JP)
YOSHINO TSUTOMU (JP)
ONISHI SHOGO (JP)
YOSHIZAKI YUKINOBU (JP)
YOSHINO TSUTOMU (JP)
ONISHI SHOGO (JP)
YOSHIZAKI YUKINOBU (JP)
Application Number:
PCT/JP2018/005779
Publication Date:
September 13, 2018
Filing Date:
February 19, 2018
Export Citation:
Assignee:
FUJIMI INC (JP)
International Classes:
H01L21/304; C11D3/37; C11D7/22
Domestic Patent References:
| WO2012039390A1 | 2012-03-29 |
Foreign References:
| JP2013243208A | 2013-12-05 | |||
| JP2006080501A | 2006-03-23 |
Attorney, Agent or Firm:
HATTA & ASSOCIATES (JP)
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