Title:
SURFACE TREATMENT METHOD OF WAFER AND COMPOSITION USED FOR SAID METHOD
Document Type and Number:
WIPO Patent Application WO/2019/193967
Kind Code:
A1
Abstract:
The present invention provides a novel vapor-treatment composition that can exhibit a water-repellency-imparting effect equivalent to that when a wafer surface having an Si element is treated using vapor of a prior-art composition (in which there are numerous types of water-repellent-protective-film-forming components), and that has excellent chemical stability, there being fewer types of water-repellent-protective-film-forming components than in the prior art. The present invention also provides a treatment method for a wafer surface having an Si element in which the vapor of said novel composition is used. The surface treatment method of a wafer of the present invention is a method in which, in cleaning of a wafer having a recess/projection pattern on the surface, and having an Si element at least in said recesses, in a state in which a liquid is held at least in the recesses of the recess/projection pattern, a vapor of the composition containing a water-repellent-protective-film-forming component and a solvent is supplied to the recess/projection pattern surface, the vapor undergoes a state change to a liquid state, the liquid held in the recesses is replaced with the liquid of said composition, and a water-repellent-protective film is formed at least on the recess surface, wherein this surface treatment method is characterized in that the water-repellent-protective-film-forming component is only the compound represented by general formula [1], the solvent contains at least an acyclic carbonate ester, and the amount of the acyclic carbonate ester in the solvent total amount is 50 to 100 mass%. (In formula [1], each individual R1 group is selected from an H group, a C1-10 hydrocarbon group, and a C1-10 hydrocarbon group for which some or all of the hydrogen atoms are substituted with fluorine atoms; x is an integer of 1 to 3; Each R2 group is mutually independently selected from methyl groups, ethyl groups, and acetyl groups for which, optionally, some or all of the hydrogen atoms are substituted with fluorine atoms.)
Inventors:
TERUI YOSHIHARU (JP)
Application Number:
PCT/JP2019/011387
Publication Date:
October 10, 2019
Filing Date:
March 19, 2019
Export Citation:
Assignee:
CENTRAL GLASS CO LTD (JP)
International Classes:
H01L21/304; H01L21/027
Foreign References:
| US20180277357A1 | 2018-09-27 | |||
| JP2013118347A | 2013-06-13 | |||
| JP2013168583A | 2013-08-29 | |||
| JP2012204669A | 2012-10-22 | |||
| JP2010103136A | 2010-05-06 | |||
| JP2017038029A | 2017-02-16 |
Attorney, Agent or Firm:
KOBAYASHI, Hiromichi et al. (JP)
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