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Patent Searching and Data


Title:
SUSCEPTOR
Document Type and Number:
WIPO Patent Application WO/2014/132948
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a susceptor with which adverse effects on the quality of a semiconductor material can be inhibited by inhibiting secondary gas reactions caused when carbon comes into contact with a secondary gas. The present invention is provided with: a secondary-gas introduction port (12) for introducing a secondary gas into an interior; a first secondary-gas passage (10) which is provided between secondary-gas discharge ports (16) for discharging the secondary gas to an exterior, and which is provided with an inner wall comprising carbon; strip grooves (15) which are provided extending in a curved manner, to a wafer-facing surface, and which have, provided therein, the secondary-gas discharge ports (16); and a protective member (11) which is provided to at least a portion of the first secondary-gas passage (10) so as to cover the inner wall of the secondary-gas passage (10), and in which a surface at a side thereof that comes into contact with the secondary gas is configured from a resistant material having a low reactivity with caustic gas.

Inventors:
NAKAYA SATOSHI (JP)
Application Number:
PCT/JP2014/054459
Publication Date:
September 04, 2014
Filing Date:
February 25, 2014
Export Citation:
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Assignee:
TOYO TANSO CO (JP)
International Classes:
H01L21/205; C23C16/458; H01L21/683
Foreign References:
JP2008522035A2008-06-26
JP2004507619A2004-03-11
JPH0778276B21995-08-23
JP2007096280A2007-04-12
JP2010030846A2010-02-12
JPH0778276B21995-08-23
JP2004507619A2004-03-11
Other References:
See also references of EP 2963676A4
Attorney, Agent or Firm:
KITADAI, Tetsuo et al. (JP)
Tetsuo Kitadai (JP)
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