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Patent Searching and Data


Title:
SYNTHETIC AMORPHOUS SILICA POWDER AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2011/083699
Kind Code:
A1
Abstract:
Disclosed is a synthetic amorphous silica powder, which is obtained by subjecting a silica powder to spheroidizing treatment and then cleaning and drying the resulting silica powder, and which has an average particle diameter D50 of 10-2,000 μm. The synthetic amorphous silica powder is characterized by having a value, which is obtained by dividing the BET specific surface area by the theoretical specific surface area as calculated from the average particle diameter D50, of 1.00-1.35, a true density of 2.10-2.20 g/cm3, an intramolecular porosity of 0-0.05, a circularity of 0.75-1.00, and an undissolved ratio of 0.00-0.25. Since the amount of gas components adsorbed on the surface of the synthetic amorphous silica powder or contained in the powder is little, a synthetic silica glass product that is produced using the powder can be greatly reduced in generation or expansion of gas bubbles even when used in a high temperature and reduced pressure environment.

Inventors:
UEDA TOSHIAKI (JP)
Application Number:
PCT/JP2010/073291
Publication Date:
July 14, 2011
Filing Date:
December 24, 2010
Export Citation:
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Assignee:
MITSUBISHI MATERIALS CORP (JP)
UEDA TOSHIAKI (JP)
International Classes:
C01B33/18; B01J19/08; B07B4/02; B22F1/00
Foreign References:
JPH06287012A1994-10-11
JP2004225135A2004-08-12
JP2005531475A2005-10-20
JPH06191823A1994-07-12
Other References:
See also references of EP 2522629A4
Attorney, Agent or Firm:
SUDA, MASAYOSHI (JP)
Masayoshi Suda (JP)
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Claims: