SYNTHETIC AMORPHOUS SILICA POWDER AND METHOD FOR PRODUCING SAME

WIPO Patent Application WO/2011/083710

A1

Disclosed is a synthetic amorphous silica powder, which is obtained by subjecting a granulated silica powder to spheroidizing treatment and then cleaning and drying the resulting silica powder, and which has an average particle diameter D50 of 10-2,000 μm. The synthetic amorphous silica powder is characterized by having a value, which is obtained by dividing the BET specific surface area by the theoretical specific surface area as calculated from the average particle diameter D50, of more than 1.35 but 1.75 or less, a true density of 2.10-2.20 g/cm3, an intramolecular porosity of 0-0.05 (inclusive), a circularity of 0.50-0.75 (inclusive), and a spheroidization ratio of 0.20 or more but less than 0.55. Since the amount of gas components adsorbed on the surface of the synthetic amorphous silica powder or contained in the powder is little, a synthetic silica glass product that is produced using the powder can be greatly reduced in generation or expansion of gas bubbles even when used in a high temperature and reduced pressure environment.

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UEDA, Toshiaki (15-2 Aza Fukimatsu, Onahama, Iwaki-sh, Fukushima 01, 〒9718101, JP)

JP2010/073499

July 14, 2011

December 27, 2010

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MITSUBISHI MATERIALS CORPORATION (3-2 Otemachi 1-chome, Chiyoda-ku Tokyo, 17, 〒1008117, JP)
三菱マテリアル株式会社 (〒17 東京都千代田区大手町一丁目３番２号 Tokyo, 〒1008117, JP)

C01B33/18; B01J19/08; B07B4/02; B22F1/00

SUDA, Masayoshi (OAK Ikebukuro Bldg, 21-11 Higashi-Ikebukuro 1-chome, Toshima-k, Tokyo 13, 〒1700013, JP)

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