Title:
SYNTHETIC QUARTZ GLASS SUBSTRATE POLISHING AGENT, PRODUCTION METHOD THEREFOR, AND SYNTHETIC QUARTZ GLASS SUBSTRATE POLISHING METHOD
Document Type and Number:
WIPO Patent Application WO/2018/190077
Kind Code:
A1
Abstract:
The present invention provides a synthetic quartz glass substrate polishing agent comprising polishing particles and water, and is characterized in that the polishing particles comprise silica particles as base particles, on the surface of which are supported particles of a composite oxide of cerium and at least one rare-earth element selected from among trivalent rare-earth elements excluding cerium. The synthetic quartz glass substrate polishing agent has a high polishing rate and is capable of reducing the occurrence of polishing defects to a sufficient degree.
Inventors:
TAKAHASHI MITSUHITO (JP)
NOJIMA YOSHIHIRO (JP)
NOJIMA YOSHIHIRO (JP)
Application Number:
PCT/JP2018/010756
Publication Date:
October 18, 2018
Filing Date:
March 19, 2018
Export Citation:
Assignee:
SHINETSU CHEMICAL CO (JP)
International Classes:
B24B37/00; C09K3/14; C03C19/00; C09G1/02
Domestic Patent References:
| WO2017183290A1 | 2017-10-26 | |||
| WO2017081835A1 | 2017-05-18 | |||
| WO2016159167A1 | 2016-10-06 | |||
| WO1999008838A1 | 1999-02-25 |
Foreign References:
| JP2012066370A | 2012-04-05 | |||
| JPS6327389B2 | 1988-06-02 |
Attorney, Agent or Firm:
YOSHIMIYA Mikio et al. (JP)
Download PDF:
Previous Patent: DEVICE FOR CONTROLLING POWER CONVERSION CIRCUIT
Next Patent: HEAVY DUTY PNEUMATIC RADIAL TIRE
Next Patent: HEAVY DUTY PNEUMATIC RADIAL TIRE