Title:
SYSTEM FOR ANALYZING STRESS OF CURVED DETECTION SAMPLE
Document Type and Number:
WIPO Patent Application WO/2020/191545
Kind Code:
A1
Abstract:
A system for analyzing stress of a curved detection sample, comprising: a light source (10) configured to emit an illumination beam; and a polarizer (20), a first wavefront modulation lens (30), a curved detection sample, a second wavefront modulation lens (40), an analyzer (50), and an image sensor (60) sequentially provided on a light path of the illumination beam. The thickness distribution of the first wavefront modulation lens (30) and the distance from the first wavefront modulation lens (30) to the curved detection sample satisfy the condition that: the wavefront of the illumination beam reaching the incident surface of the curved detection sample is consistent with the incident surface of the curved detection sample. The image sensor (60) is configured to acquire an interference image of the illumination beam. The apparatus further comprises a processor (70) configured to obtain the interference image acquired by the image sensor (60) and to detect stress distribution of the curved detection sample according to the interference image. The system for analyzing stress of a curved detection sample is more accurate.
Inventors:
WANG XINGZE (CN)
HE LIANGYU (CN)
YAN JING (CN)
HE LIANGYU (CN)
YAN JING (CN)
Application Number:
PCT/CN2019/079333
Publication Date:
October 01, 2020
Filing Date:
March 22, 2019
Export Citation:
Assignee:
HEREN KEJI SHENZHEN LLC (CN)
International Classes:
G01N21/17
Domestic Patent References:
| WO2016090071A1 | 2016-06-09 |
Foreign References:
| CN102844651A | 2012-12-26 | |||
| CN103543129A | 2014-01-29 | |||
| CN102141515A | 2011-08-03 |
Attorney, Agent or Firm:
SCIHEAD IP LAW FIRM (CN)
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