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Title:
SYSTEM AND METHOD FOR ABSORBING MOISTURE WITHIN A FACE MASK
Document Type and Number:
WIPO Patent Application WO/2019/100285
Kind Code:
A1
Abstract:
A face mask (100) may comprise at least one layer of filtration material (218)configured to filter one or more harmful substances from the air breathed by a user; at least one layer of absorbent material (214)configured to absorb moisture exhaled by the user, wherein the at least one layer of absorbent material (214) spans the entire inner surface area of the mask (100); at least one layer of waterproof material (216) located between the at least one layer of filtration material (218) and the at least one layer of absorbent material (214) configured to prevent moisture from the absorbent material from contacting the filtration material; and at least one layer of anti-bacterial material (212) located adjacent to the at least one layer of absorbent material (214) and forming the inner surface of the mask (100). The face mask (100) can absorb moisture exhaled by a user.

Inventors:
HAN, Charlie (Honeywell International Inc, Intellectual Property--Patent Services115 Tabor Road, M/S 4D, Morris Plains New Jersey, 07950, US)
LU, Kevin (Honeywell International Inc, Intellectual Property--Patent Services115 Tabor Road, M/S 4D, Morris Plains New Jersey, 07950, US)
XIANG, Robin (Honeywell International Inc, Intellectual Property--Patent Services115 Tabor Road, M/S 4D, Morris Plains New Jersey, 07950, US)
SHEN, Jerry (Honeywell International Inc, Intellectual Property--Patent Services115 Tabor Road, M/S 4D, Morris Plains New Jersey, 07950, US)
Application Number:
CN2017/112579
Publication Date:
May 31, 2019
Filing Date:
November 23, 2017
Export Citation:
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Assignee:
HONEYWELL INTERNATIONAL INC. (115 Tabor Road, M/S 4D3Morris Plains, New Jersey, 07950, US)
HAN, Charlie (Honeywell International Inc, Intellectual Property--Patent Services115 Tabor Road, M/S 4D, Morris Plains New Jersey, 07950, US)
LU, Kevin (Honeywell International Inc, Intellectual Property--Patent Services115 Tabor Road, M/S 4D, Morris Plains New Jersey, 07950, US)
XIANG, Robin (Honeywell International Inc, Intellectual Property--Patent Services115 Tabor Road, M/S 4D, Morris Plains New Jersey, 07950, US)
SHEN, Jerry (Honeywell International Inc, Intellectual Property--Patent Services115 Tabor Road, M/S 4D, Morris Plains New Jersey, 07950, US)
International Classes:
A41D13/11
Domestic Patent References:
WO2016074219A12016-05-19
WO2017063137A12017-04-20
Foreign References:
CN205682514U2016-11-16
CN201248380Y2009-06-03
CN202941439U2013-05-22
Attorney, Agent or Firm:
CHINA PATENT AGENT (H.K.) LTD. (22/F, Great Eagle Center23 Harbour Road, Wanchai, Hong Kong, Kong, CN)
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