Title:
SYSTEM AND METHOD FOR CARRYING OUT LIQUID AND SUBSEQUENT DRYING TREATMENTS ON ONE OR MORE WAFERS
Document Type and Number:
WIPO Patent Application WO2005123281
Kind Code:
A3
Abstract:
Systems for processing microelectronic substrates in a process chamber that incorporate improved technology for transitioning from a wet process to a dry process (especially transitioning from rinsing to drying). At least a portion of residual liquid remaining in fluid supply lines (52c, 52d) after a wet treatment is removed via a pathway (62, 64, 66) that avoids purging directly onto the substrates. Related methods are also included in the present invention.
Inventors:
BENSON ARNE C (US)
OLSON ERIK D (US)
SPAETH DOUGLAS S (US)
OLSON ERIK D (US)
SPAETH DOUGLAS S (US)
Application Number:
PCT/US2005/018615
Publication Date:
May 26, 2006
Filing Date:
May 25, 2005
Export Citation:
Assignee:
FSI INT INC (US)
BENSON ARNE C (US)
OLSON ERIK D (US)
SPAETH DOUGLAS S (US)
BENSON ARNE C (US)
OLSON ERIK D (US)
SPAETH DOUGLAS S (US)
International Classes:
B08B3/02; H01L21/00; H01L21/306; (IPC1-7): B08B3/02; H01L21/00
Domestic Patent References:
| WO2001028950A1 | 2001-04-26 |
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